| Irfu-08-354
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| Results from atomic layer deposition and tunneling deposition for superconducting RF cavities. |
| Th. Proslier, J. Zasadzinski, J. Norem, M. Pellin, J.Elam, J. Moore, L. Cooley, C. Antoine |
| Atomic Layer Deposition (ALD) is a process that
synthesizes materials in successive monolayers, at rates up to 1 micron/hour. We have been using this technique at Argonne as a possible way to improve superconducting radio frequency (SCRF) cavities performances. Initial experiments using tunneling spectroscopy and ALD have led to a new model for dissipation mechanisms occurring at the surface and news ways of controlling SCRF surfaces, as well as suggesting ways to significantly improve the operating gradients of superconducting cavities. Initial measurements of ALD treated samples show significant improvement over untreated cavity-grade Nb samples. We will report these results. |
